<Title:> 分子軌道法を用いたチタニア共析めっき機構の研究
<Author(s):> 宮井 菜月, 島崎 峻州, 内田 希
<Corresponding author E-Mill:> solgel2(at)vos.nagaokaut.ac.jp
<Abstract:> Composite plating of TiO2 nanoparticle with electrolessly plated nickel films was developed by Matsubara. Although, it is assumed that the eutectoid mechanism is divided into four steps of adsorption, it is not elucidated. So elucidating the eutectoid mechanism at the molecular level provides valuable information about not only this composite plating but also other type of plating. It should be noted that TiO2 surface charge is changed by pH of plating bath. As we conduct a study on the interaction of TiO2 with reactant, it is important to consider the TiO2 surface state i.e., TiO2 surface charge. In this study, we aim to reveal the eutectoid mechanism at molecular level and the influence of TiO2 surface charge in eutectoid by using molecular orbital calculation. For theoretical chemical calculations, we used the publicly available semi-empirical calculation software MOPAC2012. The Hamiltonian PM7 to be used for molecular orbital calculation semi-empirical. We used the citric acid as organic acid, and Ti2O2 is adopted as TiO2.The result shows that the adsorption energy (ΔEad) under acidic condition has lowest value within last step of the eutectoid.
<Keywords:> Composite plating, Molecular Orbital method, TiO2, Ni plating, PH
<URL:> https://www.jstage.jst.go.jp/article/jccj/14/3/14_2015-0035/_article/-char/ja/
